1.(3)The content of Ca (75.832ug.g-l) in the black polished rice was significantly higher than that (63.876ug.g-l) in the white polished rice and that (59.224ug.g-l) in the red polished rice.
③．黑米精米中Ca含量(平均75.832ug.g~(-1))极显著高于白米精米(63.876ug.g~(-1))和红米精米(59.224ug.g~(-1))；
2.Some effects on optical power attenuation properties were analyzed, such as the polished length, the thickness of the remained cladding of side-polished fiber, and the refractive index (RI) of polymer covered on the polished area.
同时计算了侧边抛磨光纤在不同的结构参数及聚合物折射率参数下的光功率传输特性，分析了光纤抛磨长度、剩余包层厚度及抛磨区涂覆的聚合物折射率这三个参数对抛磨光纤器件的光功率传输特性的影响。 研究表明，当抛磨长度小于9mm时，光功率衰减随剩余包层厚度的增大单调递减；
3.his polished prose; in a freshly ironed dress and polished shoes; freshly polished silver.
他精美的散文；穿着铁色的新衣和光亮的鞋子；闪闪发亮的银子。
4.③The content of Ca in the black polished rice (75. 832 μg·g-1) was significantly higher than that in the white polished rice (63. 876 μg· g-1) and that in the red polished rice (59. 224 μg·g-1).
③黑米Ca含量(平均75.832μg·g~(-1))极显著高于白米(63.876μg·g~(-1))和红米(59.224μg·g~(-1)),其余的各元素差异不显著。
5.It is mianly equipped with rice hulling machine for milling unpolished rice into polished rice and milling polished rice from rough rice by one time and is widely suitable for rice mills in urban and rural areas.
主要与砻谷机配套、将糙米碾成白米，也可将稻谷一次碾成白米，广泛适用于城市、农村的大米加工厂。
6.The sword is appointed to be polished, to be grasped with the hand; it is sharpened and polished, made ready for the hand of the slayer.
11这刀已经交给人擦亮，为要应手使用。这刀已经磨快擦亮，好交在行杀戮的人手中。
7."It is given to be polished, that it may be handled; the sword is sharpened and polished, to give it into the hand of the slayer.
结21:11这刀已经交给人擦亮、为要应手使用．这刀已经磨快擦亮、好交在行杀戮的人手中。
8.Here we have one common polished tile， one Pure Bright polished tile.
这里有一块普通的抛光砖，和一块超洁亮抛光砖。
10.The investigation shows that for BCP polished cavities the relationship E_(acc) ∝RRR~(1/2) was statistically observed, while for EP polished cavities E_(acc) seems to be independent on RRR when RRR>200. It suggests that E-polishing probably produces defect-free surface.
对近100 个超导腔与RRR 的关系进行的统计分析表明BCP(buffered chemical polishing) 化学抛光的超导腔加速场梯度呈现E_(acc) ∝RRR~(1/2) 的关系,而对于EP(Electro-polishing)电化学抛光的超导腔,当RRR 大于200 时, E_(acc) 基本上与RRR 无关。
